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    Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm

    New search for: Trentzsch, M.
    New search for: Golz, C.
    New search for: Wieczorek, K.
    New search for: Stephan, R.
    New search for: Mantei, T.
    New search for: Bayha, B.
    New search for: Ohsiek, S.
    New search for: Raab, M.
    New search for: Nenyei, Z.
    New search for: Lerch, W.
    New search for: Lerch, W.
    New search for: Niess, J.

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    Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm

    New search for: Trentzsch, M.
    New search for: Golz, C.
    New search for: Wieczorek, K.
    New search for: Stephan, R.
    New search for: Mantei, T.
    New search for: Bayha, B.
    New search for: Ohsiek, S.
    New search for: Raab, M.
    New search for: Nenyei, Z.
    New search for: Lerch, W.
    New search for: Lerch, W.
    New search for: Niess, J.

    Access

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    Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm

    New search for: Trentzsch, M.
    New search for: Golz, C.
    New search for: Wieczorek, K.
    New search for: Stephan, R.
    New search for: Mantei, T.
    New search for: Bayha, B.
    New search for: Ohsiek, S.
    New search for: Raab, M.
    New search for: Nenyei, Z.
    New search for: Lerch, W.
    New search for: Lerch, W.
    New search for: Niess, J.

    Access

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    Document information
    Title:

    Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm

    Contributors:

    Trentzsch, M. (author) / Golz, C. (author) / Wieczorek, K. (author) / Stephan, R. (author) / Mantei, T. (author) / Bayha, B. (author) / Ohsiek, S. (author) / Raab, M. (author) / Nenyei, Z. (author) / Lerch, W. (author)

    Published in:

    Rapid Thermal Processing and beyond: Applications in Semiconductor Processing ; 153-164

    MATERIALS SCIENCE FORUM ; 573/574

    Publication date:

    2008-01-01

    Size:

    12 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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