Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks: Fid-Bau Portal

Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Krishnamoorthy, S. / Pugin, R. / Brugger, J. / Heinzelmann, H. / Hinderling, C.

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Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Krishnamoorthy, S. / Pugin, R. / Brugger, J. / Heinzelmann, H. / Hinderling, C.

Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Krishnamoorthy, S. / Pugin, R. / Brugger, J. / Heinzelmann, H. / Hinderling, C.

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Title:

Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

Contributors:

Krishnamoorthy, S. (author) / Pugin, R. (author) / Brugger, J. (author) / Heinzelmann, H. (author) / Hinderling, C. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 20 ; 1962-1965

Publication date:

2008-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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