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    Selective vapor phase etching of SiGe by HCl in a RPCVD reactor

    New search for: Yamamoto, Y.
    New search for: Kopke, K.
    New search for: Kurps, R.
    New search for: Tillack, B.

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    Selective vapor phase etching of SiGe by HCl in a RPCVD reactor

    New search for: Yamamoto, Y.
    New search for: Kopke, K.
    New search for: Kurps, R.
    New search for: Tillack, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Selective vapor phase etching of SiGe by HCl in a RPCVD reactor

    New search for: Yamamoto, Y.
    New search for: Kopke, K.
    New search for: Kurps, R.
    New search for: Tillack, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Selective vapor phase etching of SiGe by HCl in a RPCVD reactor

    Contributors:

    Yamamoto, Y. (author) / Kopke, K. (author) / Kurps, R. (author) / Tillack, B. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 254 ; 6037-6039

    Publication date:

    2008-01-01

    Size:

    3 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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