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    UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric

    New search for: Son, S. Y.
    New search for: Jang, J. H.
    New search for: Kumar, P.
    New search for: Ramani, K.
    New search for: Craciun, V.
    New search for: Singh, R. K.

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    UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric

    New search for: Son, S. Y.
    New search for: Jang, J. H.
    New search for: Kumar, P.
    New search for: Ramani, K.
    New search for: Craciun, V.
    New search for: Singh, R. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric

    New search for: Son, S. Y.
    New search for: Jang, J. H.
    New search for: Kumar, P.
    New search for: Ramani, K.
    New search for: Craciun, V.
    New search for: Singh, R. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    UV assisted low temperature nitridation and post deposition oxidation technique for hafnium oxide gate dielectric

    Contributors:

    Son, S. Y. (author) / Jang, J. H. (author) / Kumar, P. (author) / Ramani, K. (author) / Craciun, V. (author) / Singh, R. K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 254 ; 7087-7091

    Publication date:

    2008-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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