Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content: Fid-Bau Portal

Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

Khamseh, S. / Nose, M. / Kawabata, T. / Saiki, A. / Matsuda, K. / Terayama, K. / Ikeno, S.

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Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

Khamseh, S. / Nose, M. / Kawabata, T. / Saiki, A. / Matsuda, K. / Terayama, K. / Ikeno, S.

Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

Khamseh, S. / Nose, M. / Kawabata, T. / Saiki, A. / Matsuda, K. / Terayama, K. / Ikeno, S.

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Order at Subito €

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Document information

Title:

Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

Contributors:

Khamseh, S. (author) / Nose, M. (author) / Kawabata, T. (author) / Saiki, A. (author) / Matsuda, K. (author) / Terayama, K. (author) / Ikeno, S. (author)

Published in:

MATERIALS TRANSACTIONS ; 49 ; 2082-2090

Publication date:

2008-01-01

Size:

9 pages

ISSN:

1345-9678

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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