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Kinetic Monte Carlo simulation of {111}-oriented SiC film with chemical vapor deposition

Liu, C. x. / Yang, Y. q. / Zhang, R. j. / Ren, X. x.

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Kinetic Monte Carlo simulation of {111}-oriented SiC film with chemical vapor deposition

Liu, C. x. / Yang, Y. q. / Zhang, R. j. / Ren, X. x.

Kinetic Monte Carlo simulation of {111}-oriented SiC film with chemical vapor deposition

Liu, C. x. / Yang, Y. q. / Zhang, R. j. / Ren, X. x.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Kinetic Monte Carlo simulation of {111}-oriented SiC film with chemical vapor deposition

Contributors:

Liu, C. x. (author) / Yang, Y. q. (author) / Zhang, R. j. (author) / Ren, X. x. (author)

Published in:

COMPUTATIONAL MATERIALS SCIENCE ; 43 ; 1036-1041

Publication date:

2008-01-01

Size:

6 pages

ISSN:

0927-0256

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 510

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