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    Interlayer analysis of HfO2/SiO2/Si by SIMS and HRBS

    New search for: Sasakawa, K.
    New search for: Fujikawa, K.
    New search for: Toyoda, T.

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    Interlayer analysis of HfO2/SiO2/Si by SIMS and HRBS

    New search for: Sasakawa, K.
    New search for: Fujikawa, K.
    New search for: Toyoda, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Interlayer analysis of HfO2/SiO2/Si by SIMS and HRBS

    New search for: Sasakawa, K.
    New search for: Fujikawa, K.
    New search for: Toyoda, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Interlayer analysis of HfO2/SiO2/Si by SIMS and HRBS

    Contributors:

    Sasakawa, K. (author) / Fujikawa, K. (author) / Toyoda, T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 255 ; 1551-1554

    Publication date:

    2008-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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