X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure: Fid-Bau Portal

X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure

Tan, R. / Azuma, Y. / Kojima, I.

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X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure

Tan, R. / Azuma, Y. / Kojima, I.

X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure

Tan, R. / Azuma, Y. / Kojima, I.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure

Contributors:

Tan, R. (author) / Azuma, Y. (author) / Kojima, I. (author)

Published in:

APPLIED SURFACE SCIENCE ; 241 ; 135-140

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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