Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing: Fid-Bau Portal

Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing

Arjunan, A. C. / Singh, D. / Wang, H. T. / Ren, F. / Kumar, P. / Singh, R. K. / Pearton, S. J.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing

Arjunan, A. C. / Singh, D. / Wang, H. T. / Ren, F. / Kumar, P. / Singh, R. K. / Pearton, S. J.

Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing

Arjunan, A. C. / Singh, D. / Wang, H. T. / Ren, F. / Kumar, P. / Singh, R. K. / Pearton, S. J.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing

Contributors:

Arjunan, A. C. (author) / Singh, D. (author) / Wang, H. T. (author) / Ren, F. (author) / Kumar, P. (author) / Singh, R. K. (author) / Pearton, S. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 3085-3089

Publication date:

2008-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Lee, K.Y. / Chen, W.Z. / Capano, M.A. | British Library Online Contents | 2009

The Impact of Chemical-Mechanical Polishing on Defective 4H-SiC Schottky Barrier Diodes

Lee, K.Y. / Chen, W.Z. / Capano, M.A. | British Library Online Contents | 2009

Improved Acoustoelectric Schottky-Diode/LiNbO3 Memory Correlator

R. W. Ralston / S. A. Reible / J. H. Cafarella et al. | NTIS | 1977

Preparation of large area free-standing GaN substrates by HVPE using mechanical polishing liftoff method

Kim, H. M. / Oh, J. E. / Kang, T. W. | British Library Online Contents | 2001

Characteristics in chemical-mechanical polishing of copper: comparison of polishing pads

Stavreva, Z. / Zeidler, D. / Ploetner, M. et al. | British Library Online Contents | 1997