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Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing
Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing
Improved free-standing GaN Schottky diode characteristics using chemical mechanical polishing
Arjunan, A. C. (Autor:in) / Singh, D. (Autor:in) / Wang, H. T. (Autor:in) / Ren, F. (Autor:in) / Kumar, P. (Autor:in) / Singh, R. K. (Autor:in) / Pearton, S. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 3085-3089
01.01.2008
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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