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Characteristics in chemical-mechanical polishing of copper: comparison of polishing pads
Characteristics in chemical-mechanical polishing of copper: comparison of polishing pads
Characteristics in chemical-mechanical polishing of copper: comparison of polishing pads
Stavreva, Z. (author) / Zeidler, D. (author) / Ploetner, M. (author) / Drescher, K. (author)
APPLIED SURFACE SCIENCE ; 108 ; 39-44
1997-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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