Reduced Pressure-Chemical Vapour Deposition of Si/SiGe heterostructures for nanoelectronics: Fid-Bau Portal

Reduced Pressure-Chemical Vapour Deposition of Si/SiGe heterostructures for nanoelectronics

Hartmann, J. M. / Andrieu, F. / Lafond, D. / Ernst, T. / Bogumilowicz, Y. / Delaye, V. / Weber, O. / Rouchon, D. / Papon, A. M. / Cherkashin, N.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Reduced Pressure-Chemical Vapour Deposition of Si/SiGe heterostructures for nanoelectronics

Hartmann, J. M. / Andrieu, F. / Lafond, D. / Ernst, T. / Bogumilowicz, Y. / Delaye, V. / Weber, O. / Rouchon, D. / Papon, A. M. / Cherkashin, N.

Reduced Pressure-Chemical Vapour Deposition of Si/SiGe heterostructures for nanoelectronics

Hartmann, J. M. / Andrieu, F. / Lafond, D. / Ernst, T. / Bogumilowicz, Y. / Delaye, V. / Weber, O. / Rouchon, D. / Papon, A. M. / Cherkashin, N.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Reduced Pressure-Chemical Vapour Deposition of Si/SiGe heterostructures for nanoelectronics

Contributors:

Hartmann, J. M. (author) / Andrieu, F. (author) / Lafond, D. (author) / Ernst, T. (author) / Bogumilowicz, Y. (author) / Delaye, V. (author) / Weber, O. (author) / Rouchon, D. (author) / Papon, A. M. (author) / Cherkashin, N. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 154-155 ; 76-84

Publication date:

2008-01-01

Size:

9 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Greve, D. W. | British Library Online Contents | 1993

Templated self-organization of SiGe quantum structures for nanoelectronics

Grützmacher, D. / Dais, C. / Zhang, L. et al. | British Library Online Contents | 2007

Sharp boron doping within thin SiGe layer by rapid thermal chemical vapour deposition

Tillack, B. / Ritter, G. / Krueger, D. et al. | British Library Online Contents | 1995

Fabrication of SiGe quantum wires and dots by low pressure chemical vapour deposition on patterned silicon substrates

Hartmann, A. / Vescan, L. / Dieker, C. et al. | British Library Online Contents | 1995

Incorporation of boron in SiGe(C) epitaxial layers grown by reduced pressure chemical vapor deposition

Hallstedt, J. / Parent, A. / Ostling, M. et al. | British Library Online Contents | 2005