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Sharp boron doping within thin SiGe layer by rapid thermal chemical vapour deposition

Tillack, B. / Ritter, G. / Krueger, D. / Zaumseil, P. / Morgenstern, G. / Glowatzki, K.-D.

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Sharp boron doping within thin SiGe layer by rapid thermal chemical vapour deposition

Tillack, B. / Ritter, G. / Krueger, D. / Zaumseil, P. / Morgenstern, G. / Glowatzki, K.-D.

Sharp boron doping within thin SiGe layer by rapid thermal chemical vapour deposition

Tillack, B. / Ritter, G. / Krueger, D. / Zaumseil, P. / Morgenstern, G. / Glowatzki, K.-D.

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Document information

Title:

Sharp boron doping within thin SiGe layer by rapid thermal chemical vapour deposition

Contributors:

Tillack, B. (author) / Ritter, G. (author) / Krueger, D. (author) / Zaumseil, P. (author) / Morgenstern, G. (author) / Glowatzki, K.-D. (author)

Published in:

MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 11 ; 1060-1064

Publication date:

1995-01-01

Size:

5 pages

ISSN:

0267-0836

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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