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    The effect of substrate bias voltages on impact resistance of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering

    New search for: Chunyan, Y.
    New search for: Linhai, T.
    New search for: Yinghui, W.
    New search for: Shebin, W.
    New search for: Tianbao, L.
    New search for: Bingshe, X.

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    The effect of substrate bias voltages on impact resistance of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering

    New search for: Chunyan, Y.
    New search for: Linhai, T.
    New search for: Yinghui, W.
    New search for: Shebin, W.
    New search for: Tianbao, L.
    New search for: Bingshe, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The effect of substrate bias voltages on impact resistance of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering

    New search for: Chunyan, Y.
    New search for: Linhai, T.
    New search for: Yinghui, W.
    New search for: Shebin, W.
    New search for: Tianbao, L.
    New search for: Bingshe, X.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    The effect of substrate bias voltages on impact resistance of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering

    Contributors:

    Chunyan, Y. (author) / Linhai, T. (author) / Yinghui, W. (author) / Shebin, W. (author) / Tianbao, L. (author) / Bingshe, X. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 255 ; 4033-4038

    Publication date:

    2009-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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