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    Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

    New search for: Lv, Y.
    New search for: Ji, L.
    New search for: Liu, X.
    New search for: Li, H.
    New search for: Zhou, H.
    New search for: Chen, J.

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    Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

    New search for: Lv, Y.
    New search for: Ji, L.
    New search for: Liu, X.
    New search for: Li, H.
    New search for: Zhou, H.
    New search for: Chen, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

    New search for: Lv, Y.
    New search for: Ji, L.
    New search for: Liu, X.
    New search for: Li, H.
    New search for: Zhou, H.
    New search for: Chen, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

    Contributors:

    Lv, Y. (author) / Ji, L. (author) / Liu, X. (author) / Li, H. (author) / Zhou, H. (author) / Chen, J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 3864-3870

    Publication date:

    2012-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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