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Post Metallization Annealing Characterization of Interface Properties of High- kappa Dielectrics Stack on Silicon Carbide
Post Metallization Annealing Characterization of Interface Properties of High- kappa Dielectrics Stack on Silicon Carbide
Post Metallization Annealing Characterization of Interface Properties of High- kappa Dielectrics Stack on Silicon Carbide
Weng, M.H. (author) / Mahapatra, R. (author) / Wright, N.G. (author) / Horsfall, A.B. (author)
MATERIALS SCIENCE FORUM ; 600/603 ; 771-774
2009-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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