Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films: Fid-Bau Portal

Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

Chan, K. Y. / Luo, P. Q. / Zhou, Z. B. / Tou, T. Y. / Teo, B. S.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

Chan, K. Y. / Luo, P. Q. / Zhou, Z. B. / Tou, T. Y. / Teo, B. S.

Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

Chan, K. Y. / Luo, P. Q. / Zhou, Z. B. / Tou, T. Y. / Teo, B. S.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

Contributors:

Chan, K. Y. (author) / Luo, P. Q. (author) / Zhou, Z. B. (author) / Tou, T. Y. (author) / Teo, B. S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 5186-5190

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Cai, X. M. / Hao, Y. Q. / Zhang, D. P. et al. | British Library Online Contents | 2009

Properties of titanium nitride films prepared by direct current magnetron sputtering

Jeyachandran, Y. L. / Narayandass, S. K. / Mangalaraj, D. et al. | British Library Online Contents | 2007

Polycrystalline films of tungsten-doped indium oxide prepared by d.c. magnetron sputtering

Abe, Y. / Ishiyama, N. | British Library Online Contents | 2007

Effects of deposition parameters on tantalum films deposited by direct current magnetron sputtering in Ar-O2 mixture

Zhou, Y. M. / Xie, Z. / Xiao, H. N. et al. | British Library Online Contents | 2011

Influence of Magnetron Sputtering Parameters on Deposition Rate of TiO~2 Films

Sun, F.-l. / Zhang, L. | British Library Online Contents | 2014