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Influence of Magnetron Sputtering Parameters on Deposition Rate of TiO~2 Films

Sun, F.-l. / Zhang, L.

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Influence of Magnetron Sputtering Parameters on Deposition Rate of TiO~2 Films

Sun, F.-l. / Zhang, L.

Influence of Magnetron Sputtering Parameters on Deposition Rate of TiO~2 Films

Sun, F.-l. / Zhang, L.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of Magnetron Sputtering Parameters on Deposition Rate of TiO~2 Films

Contributors:

Sun, F.-l. (author) / Zhang, L. (author)

Published in:

MATERIALS PROTECTION -WUHAN- ; 47 ; 42-44

Publication date:

2014-01-01

Size:

3 pages

ISSN:

1001-1560

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.1

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