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    Surface passivation at low temperature of p- and n-type silicon wafers using a double layer a-Si:H/SiNx:H

    New search for: Focsa, A.
    New search for: Slaoui, A.
    New search for: Charifi, H.
    New search for: Stoquert, J. P.
    New search for: Roques, S.

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    Surface passivation at low temperature of p- and n-type silicon wafers using a double layer a-Si:H/SiNx:H

    New search for: Focsa, A.
    New search for: Slaoui, A.
    New search for: Charifi, H.
    New search for: Stoquert, J. P.
    New search for: Roques, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Surface passivation at low temperature of p- and n-type silicon wafers using a double layer a-Si:H/SiNx:H

    New search for: Focsa, A.
    New search for: Slaoui, A.
    New search for: Charifi, H.
    New search for: Stoquert, J. P.
    New search for: Roques, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Surface passivation at low temperature of p- and n-type silicon wafers using a double layer a-Si:H/SiNx:H

    Contributors:

    Focsa, A. (author) / Slaoui, A. (author) / Charifi, H. (author) / Stoquert, J. P. (author) / Roques, S. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 159-160 ; 242-247

    Publication date:

    2009-01-01

    Size:

    6 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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