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Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel

Nguyen, T. N. / Nguyen, V. D. / Jung, S. / Yi, J.

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Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel

Nguyen, T. N. / Nguyen, V. D. / Jung, S. / Yi, J.

Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel

Nguyen, T. N. / Nguyen, V. D. / Jung, S. / Yi, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Raman scattering analysis of the residual stress in metal-induced crystallized amorphous silicon thin films using nickel

Contributors:

Nguyen, T. N. (author) / Nguyen, V. D. (author) / Jung, S. (author) / Yi, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 8252-8256

Publication date:

2009-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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