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Structure and Properties of the DLC Films Deposited by RF-PECVD Process

Xie, H.-x. / Ling, G. / Zhu, Z.-t.

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Structure and Properties of the DLC Films Deposited by RF-PECVD Process

Xie, H.-x. / Ling, G. / Zhu, Z.-t.

Structure and Properties of the DLC Films Deposited by RF-PECVD Process

Xie, H.-x. / Ling, G. / Zhu, Z.-t.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Structure and Properties of the DLC Films Deposited by RF-PECVD Process

Contributors:

Xie, H.-x. (author) / Ling, G. (author) / Zhu, Z.-t. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 27 ; 190-194

Publication date:

2009-01-01

Size:

5 pages

ISSN:

1673-2812

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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