Manipulation of stored charge in anodic aluminium oxide/SiO2 dielectric stacks by the use of pulsed anodisation

Lu, Z. / Ouyang, Z. / Grant, N. et al. | British Library Online Contents | 2016

Charge Trapping at the Dielectric of Organic Transistors Visualized in Real Time and Space

Mathijssen, S. G. / Kemerink, M. / Sharma, A. et al. | British Library Online Contents | 2008

Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology

Pisecny, P. / Husekova, K. / Frohlich, K. et al. | British Library Online Contents | 2004

Nanoscale electrical characterization of ultrathin high-k dielectric MOS stacks: A conducting AFM study

Uppal, H.J. / Bernardini, S. / Efthymiou, E. et al. | British Library Online Contents | 2008

Challenges in Atomic-Scale Characterization of High-k Dielectrics and Metal Gate Electrodes for Advanced CMOS Gate Stacks

Zhu, X. / Zhu, J.-m. / Li, A. et al. | British Library Online Contents | 2009