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    Self-Similarity of Electrochemically-Deposited Copper Films on Porous Silicon

    New search for: Chen, L.L.
    New search for: Zhai, B.G.
    New search for: Huang, Y.M.
    New search for: Huang, Y.M.

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    Self-Similarity of Electrochemically-Deposited Copper Films on Porous Silicon

    New search for: Chen, L.L.
    New search for: Zhai, B.G.
    New search for: Huang, Y.M.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Self-Similarity of Electrochemically-Deposited Copper Films on Porous Silicon

    New search for: Chen, L.L.
    New search for: Zhai, B.G.
    New search for: Huang, Y.M.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Self-Similarity of Electrochemically-Deposited Copper Films on Porous Silicon

    Contributors:

    Chen, L.L. (author) / Zhai, B.G. (author) / Huang, Y.M. (author) / Huang, Y.M.

    Published in:

    Advances in Liquid Crystals ; 515-518

    KEY ENGINEERING MATERIALS ; 428/429

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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