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N+ plasma-assisted wafer bonding between silicon and chemical vapor deposition oxide at low temperature

Ma, X. / Liu, W. / Chen, C. / Xu, J. / Song, Z. / Lin, C.

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N+ plasma-assisted wafer bonding between silicon and chemical vapor deposition oxide at low temperature

Ma, X. / Liu, W. / Chen, C. / Xu, J. / Song, Z. / Lin, C.

N+ plasma-assisted wafer bonding between silicon and chemical vapor deposition oxide at low temperature

Ma, X. / Liu, W. / Chen, C. / Xu, J. / Song, Z. / Lin, C.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

N+ plasma-assisted wafer bonding between silicon and chemical vapor deposition oxide at low temperature

Contributors:

Ma, X. (author) / Liu, W. (author) / Chen, C. (author) / Xu, J. (author) / Song, Z. (author) / Lin, C. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 12 ; 161-167

Publication date:

2009-01-01

Size:

7 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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