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    Low-temperature deposition of +/--Al2O3 films by laser chemical vapor deposition using a diode laser

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    Low-temperature deposition of +/--Al2O3 films by laser chemical vapor deposition using a diode laser

    New search for: You, Y.
    New search for: Ito, A.
    New search for: Tu, R.
    New search for: Goto, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low-temperature deposition of +/--Al2O3 films by laser chemical vapor deposition using a diode laser

    New search for: You, Y.
    New search for: Ito, A.
    New search for: Tu, R.
    New search for: Goto, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Low-temperature deposition of +/--Al2O3 films by laser chemical vapor deposition using a diode laser

    Contributors:

    You, Y. (author) / Ito, A. (author) / Tu, R. (author) / Goto, T. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 3906-3911

    Publication date:

    2010-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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