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    Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets

    New search for: Zhu, H.
    New search for: Hupkes, J.
    New search for: Bunte, E.
    New search for: Huang, S. M.

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    Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets

    New search for: Zhu, H.
    New search for: Hupkes, J.
    New search for: Bunte, E.
    New search for: Huang, S. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets

    New search for: Zhu, H.
    New search for: Hupkes, J.
    New search for: Bunte, E.
    New search for: Huang, S. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets

    Contributors:

    Zhu, H. (author) / Hupkes, J. (author) / Bunte, E. (author) / Huang, S. M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 256 ; 4601-4605

    Publication date:

    2010-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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