A platform for research: civil engineering, architecture and urbanism
Use of SiCl~4 as Silicon Precursor for Low-Temperature Halo-Carbon Epitaxial Growth of 4H-SiC
Use of SiCl~4 as Silicon Precursor for Low-Temperature Halo-Carbon Epitaxial Growth of 4H-SiC
Use of SiCl~4 as Silicon Precursor for Low-Temperature Halo-Carbon Epitaxial Growth of 4H-SiC
Kotamraju, S.P. (author) / Krishnan, B. (author) / Melnychuk, G. (author) / Koshka, Y. (author) / Bauer, A.J. / Friedrichs, P. / Krieger, M. / Pensl, G. / Rupp, R. / Seyller, T.
2010-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2009
|British Library Online Contents | 2009
|British Library Online Contents | 2011
|Growth of silicon nanowires via nickel/SiCl~4 vapor-liquid-solid reaction
British Library Online Contents | 2001
|4H-SiC PiN Diodes Fabricated Using Low-Temperature Halo-Carbon Epitaxial Growth Method
British Library Online Contents | 2010
|