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    Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

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    New search for: Murata, J.
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    Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

    New search for: Sadakuni, S.
    New search for: Murata, J.
    New search for: Yagi, K.
    New search for: Sano, Y.
    New search for: Arima, K.
    New search for: Hattori, A.
    New search for: Okamoto, T.
    New search for: Yamauchi, K.
    New search for: Bauer, A.J.
    New search for: Friedrichs, P.
    New search for: Krieger, M.
    New search for: Pensl, G.
    New search for: Rupp, R.
    New search for: Seyller, T.

    Access

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    Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

    New search for: Sadakuni, S.
    New search for: Murata, J.
    New search for: Yagi, K.
    New search for: Sano, Y.
    New search for: Arima, K.
    New search for: Hattori, A.
    New search for: Okamoto, T.
    New search for: Yamauchi, K.
    New search for: Bauer, A.J.
    New search for: Friedrichs, P.
    New search for: Krieger, M.
    New search for: Pensl, G.
    New search for: Rupp, R.
    New search for: Seyller, T.

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    Document information
    Title:

    Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

    Contributors:

    Sadakuni, S. (author) / Murata, J. (author) / Yagi, K. (author) / Sano, Y. (author) / Arima, K. (author) / Hattori, A. (author) / Okamoto, T. (author) / Yamauchi, K. (author) / Bauer, A.J. / Friedrichs, P.

    Published in:

    Silicon Carbide and Related Materials 2009 ; 795-798

    MATERIALS SCIENCE FORUM ; 645/648

    Publication date:

    2010-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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