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Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects

Valentini, L. / Kenny, J. M. / Mariotto, G. / Tosi, P.

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Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects

Valentini, L. / Kenny, J. M. / Mariotto, G. / Tosi, P.

Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects

Valentini, L. / Kenny, J. M. / Mariotto, G. / Tosi, P.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects

Contributors:

Valentini, L. (author) / Kenny, J. M. (author) / Mariotto, G. (author) / Tosi, P. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 36 ; 5295-5300

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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