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Plasmochemical deposition of amorphous hydrogenated silicon films

Bosyakov, M. N. / Grunskii, D. I. / Dostanko, A. P.

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Plasmochemical deposition of amorphous hydrogenated silicon films

Bosyakov, M. N. / Grunskii, D. I. / Dostanko, A. P.

Plasmochemical deposition of amorphous hydrogenated silicon films

Bosyakov, M. N. / Grunskii, D. I. / Dostanko, A. P.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Plasmochemical deposition of amorphous hydrogenated silicon films

Contributors:

Bosyakov, M. N. (author) / Grunskii, D. I. (author) / Dostanko, A. P. (author)

Published in:

SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY C/C OF ELEKTRONNAIA OBRABOTKA MATERIALOV ; 50-58

Publication date:

1999-01-01

Size:

9 pages

ISSN:

1068-3755

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44 / 660.297

Fujii, T. / Yoshimoto, M. / Fuyuki, T. et al. | British Library Online Contents | 1994

In-situ investigations of radical kinetics in the deposition of hydrogenated amorphous silicon films

Tachibana, K. | British Library Online Contents | 1993

Multiphase structure of hydrogenated amorphous silicon carbide thin films

Wang, Y. H. / Lin, J. / Huan, C. H. | British Library Online Contents | 2002

Tin induced crystallisation of hydrogenated amorphous silicon thin films

Jeon, M. / Jeong, C. / Kamisako, K. | British Library Online Contents | 2010

Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Farjas, J. / Rath, C. / Roura, P. et al. | British Library Online Contents | 2004