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    Influence of the Sputtering Pressure on the Properties of TAZO Films Prepared by DC Magnetron Sputtering

    New search for: Liu, H.F.
    New search for: Yuan, C.K.
    New search for: Huang, Y.M.

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    Influence of the Sputtering Pressure on the Properties of TAZO Films Prepared by DC Magnetron Sputtering

    New search for: Liu, H.F.
    New search for: Yuan, C.K.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of the Sputtering Pressure on the Properties of TAZO Films Prepared by DC Magnetron Sputtering

    New search for: Liu, H.F.
    New search for: Yuan, C.K.
    New search for: Huang, Y.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    Influence of the Sputtering Pressure on the Properties of TAZO Films Prepared by DC Magnetron Sputtering

    Contributors:

    Liu, H.F. (author) / Yuan, C.K. (author) / Huang, Y.M.

    Published in:

    Optoelectronic Materials ; 1045-1048

    MATERIALS SCIENCE FORUM ; 663/665

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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