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Highly stable carbon-doped Cu films on barrierless Si

Zhang, X. Y. / Li, X. N. / Nie, L. F. / Chu, J. P. / Wang, Q. / Lin, C. H. / Dong, C.

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Highly stable carbon-doped Cu films on barrierless Si

Zhang, X. Y. / Li, X. N. / Nie, L. F. / Chu, J. P. / Wang, Q. / Lin, C. H. / Dong, C.

Highly stable carbon-doped Cu films on barrierless Si

Zhang, X. Y. / Li, X. N. / Nie, L. F. / Chu, J. P. / Wang, Q. / Lin, C. H. / Dong, C.

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Document information

Title:

Highly stable carbon-doped Cu films on barrierless Si

Contributors:

Zhang, X. Y. (author) / Li, X. N. (author) / Nie, L. F. (author) / Chu, J. P. (author) / Wang, Q. (author) / Lin, C. H. (author) / Dong, C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 3636-3640

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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