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    Diffusion barrier performance of TiVCr alloy film in Cu metallization

    New search for: Tsai, D. C.
    New search for: Huang, Y. L.
    New search for: Lin, S. R.
    New search for: Jung, D. R.
    New search for: Chang, S. Y.
    New search for: Shieu, F. S.

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    Diffusion barrier performance of TiVCr alloy film in Cu metallization

    New search for: Tsai, D. C.
    New search for: Huang, Y. L.
    New search for: Lin, S. R.
    New search for: Jung, D. R.
    New search for: Chang, S. Y.
    New search for: Shieu, F. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Diffusion barrier performance of TiVCr alloy film in Cu metallization

    New search for: Tsai, D. C.
    New search for: Huang, Y. L.
    New search for: Lin, S. R.
    New search for: Jung, D. R.
    New search for: Chang, S. Y.
    New search for: Shieu, F. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Diffusion barrier performance of TiVCr alloy film in Cu metallization

    Contributors:

    Tsai, D. C. (author) / Huang, Y. L. (author) / Lin, S. R. (author) / Jung, D. R. (author) / Chang, S. Y. (author) / Shieu, F. S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 4923-4927

    Publication date:

    2011-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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