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    Theoretical ELNES spectra of Si-K, Si-L, N-K, and O-K edges of an intergranular glassy film model in β-Si3N4

    New search for: Rulis, P.
    New search for: Ching, W. Y.

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    Theoretical ELNES spectra of Si-K, Si-L, N-K, and O-K edges of an intergranular glassy film model in β-Si3N4

    New search for: Rulis, P.
    New search for: Ching, W. Y.

    Access

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    Check availability in my library
    Order at Subito €

    Theoretical ELNES spectra of Si-K, Si-L, N-K, and O-K edges of an intergranular glassy film model in β-Si3N4

    New search for: Rulis, P.
    New search for: Ching, W. Y.

    Access

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    Document information
    Title:

    Theoretical ELNES spectra of Si-K, Si-L, N-K, and O-K edges of an intergranular glassy film model in β-Si3N4

    Contributors:

    Rulis, P. (author) / Ching, W. Y. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 46 ; 4191-4198

    Publication date:

    2011-01-01

    Size:

    8 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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