Microstructural evolution upon annealing in Ar-implanted Si: Fid-Bau Portal

Microstructural evolution upon annealing in Ar-implanted Si

Li, B. S. / Zhang, C. H. / Yang, Y. T. / Zhang, L. Q. / Xu, C. L.

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Microstructural evolution upon annealing in Ar-implanted Si

Li, B. S. / Zhang, C. H. / Yang, Y. T. / Zhang, L. Q. / Xu, C. L.

Microstructural evolution upon annealing in Ar-implanted Si

Li, B. S. / Zhang, C. H. / Yang, Y. T. / Zhang, L. Q. / Xu, C. L.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Microstructural evolution upon annealing in Ar-implanted Si

Contributors:

Li, B. S. (author) / Zhang, C. H. (author) / Yang, Y. T. (author) / Zhang, L. Q. (author) / Xu, C. L. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 9183-9187

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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