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    A Material Removal Modeling of Chemical Mechanical Polishing Based on Micro-Contact Mechanism

    New search for: Du, S.W.
    New search for: Li, Y.T.
    New search for: Song, J.J.
    New search for: Qi, H.P.
    New search for: Zhu, G.

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    A Material Removal Modeling of Chemical Mechanical Polishing Based on Micro-Contact Mechanism

    New search for: Du, S.W.
    New search for: Li, Y.T.
    New search for: Song, J.J.
    New search for: Qi, H.P.
    New search for: Zhu, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A Material Removal Modeling of Chemical Mechanical Polishing Based on Micro-Contact Mechanism

    New search for: Du, S.W.
    New search for: Li, Y.T.
    New search for: Song, J.J.
    New search for: Qi, H.P.
    New search for: Zhu, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    A Material Removal Modeling of Chemical Mechanical Polishing Based on Micro-Contact Mechanism

    Contributors:

    Du, S.W. (author) / Li, Y.T. (author) / Song, J.J. (author) / Qi, H.P. (author) / Zhu, G.

    Published in:

    Advanced Materials and Computer Science ; 472-477

    KEY ENGINEERING MATERIALS ; 474/476

    Publication date:

    2011-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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