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Study of the effect of the deposition parameters on the structural, electric and optical characteristics of polymorphous silicon films prepared by low frequency PECVD
Study of the effect of the deposition parameters on the structural, electric and optical characteristics of polymorphous silicon films prepared by low frequency PECVD
Study of the effect of the deposition parameters on the structural, electric and optical characteristics of polymorphous silicon films prepared by low frequency PECVD
Moreno, M. (author) / Torres, A. (author) / Ambrosio, R. (author) / Zuniga, C. (author) / Torres-Rios, A. (author) / Monfil, K. (author) / Rosales, P. (author) / Itzmoyotl, A. (author)
2011-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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