Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz: Fid-Bau Portal

Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

Raniero, L. / Martins, R. / Aguas, H. / Zang, S. / Ferreira, I. / Pereira, L. / Fortunato, E. / Boufendi, L.

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Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

Raniero, L. / Martins, R. / Aguas, H. / Zang, S. / Ferreira, I. / Pereira, L. / Fortunato, E. / Boufendi, L.

Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

Raniero, L. / Martins, R. / Aguas, H. / Zang, S. / Ferreira, I. / Pereira, L. / Fortunato, E. / Boufendi, L.

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Title:

Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

Contributors:

Raniero, L. (author) / Martins, R. (author) / Aguas, H. (author) / Zang, S. (author) / Ferreira, I. (author) / Pereira, L. (author) / Fortunato, E. (author) / Boufendi, L. (author)

Published in:

MATERIALS SCIENCE FORUM ; 455/456 ; 532-535

Publication date:

2004-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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