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Effect of deposition temperature on polymorphous silicon thin films by PECVD: Role of hydrogen
Effect of deposition temperature on polymorphous silicon thin films by PECVD: Role of hydrogen
Effect of deposition temperature on polymorphous silicon thin films by PECVD: Role of hydrogen
Hamui, L. (author) / Monroy, B.M. (author) / Kim, K.H. (author) / López-Suárez, A. (author) / Santoyo-Salazar, J. (author) / López-López, M. (author) / Roca i Cabarrocas, P. (author) / Santana, G. (author)
Materials science in semiconductor processing ; 41 ; 390-397
2016-01-01
8 pages
Article (Journal)
English
DDC:
621.38152
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Effect of deposition temperature on polymorphous silicon thin films by PECVD: Role of hydrogen
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