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In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers

Chen, J. / Louis, E. / Harmsen, R. / Tsarfati, T. / Wormeester, H. / van Kampen, M. / van Schaik, W. / van de Kruijs, R. / Bijkerk, F.

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In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers

Chen, J. / Louis, E. / Harmsen, R. / Tsarfati, T. / Wormeester, H. / van Kampen, M. / van Schaik, W. / van de Kruijs, R. / Bijkerk, F.

In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers

Chen, J. / Louis, E. / Harmsen, R. / Tsarfati, T. / Wormeester, H. / van Kampen, M. / van Schaik, W. / van de Kruijs, R. / Bijkerk, F.

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Document information

Title:

In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers

Contributors:

Chen, J. (author) / Louis, E. (author) / Harmsen, R. (author) / Tsarfati, T. (author) / Wormeester, H. (author) / van Kampen, M. (author) / van Schaik, W. (author) / van de Kruijs, R. (author) / Bijkerk, F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 7-12

Publication date:

2011-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Cheng, C. L. / Chia, C. T. / Chiu, C. C. et al. | British Library Online Contents | 2001

In Situ Ellipsometry in Microelectronics

Irene, E. A. / Woollam, J. A. | British Library Online Contents | 1995

The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface

Amasuga, H. / Nakamura, M. / Mera, Y. et al. | British Library Online Contents | 2002

Analysis of interface layers by spectroscopic ellipsometry

Kim, T. J. / Yoon, J. J. / Kim, Y. D. et al. | British Library Online Contents | 2008

In situ spectroscopic ellipsometry studies of electron cyclotron resonance (ECR) plasma etching of oxides of silicon and GaAs

Ianno, N. J. / Nafis, S. / Snyder, P. G. et al. | British Library Online Contents | 1993