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In situ spectroscopic ellipsometry studies of electron cyclotron resonance (ECR) plasma etching of oxides of silicon and GaAs
In situ spectroscopic ellipsometry studies of electron cyclotron resonance (ECR) plasma etching of oxides of silicon and GaAs
In situ spectroscopic ellipsometry studies of electron cyclotron resonance (ECR) plasma etching of oxides of silicon and GaAs
Ianno, N. J. (author) / Nafis, S. (author) / Snyder, P. G. (author) / Johs, B. (author)
APPLIED SURFACE SCIENCE ; 63 ; 17
1993-01-01
17 pages
Article (Journal)
Unknown
DDC:
621.35
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High-rate electron cyclotron resonance etching of GaAs via holes
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