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Effects of post-deposition rapid thermal annealing on aluminum-doped ZnO thin films grown by atomic layer deposition

Cheng, Y. C.

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Effects of post-deposition rapid thermal annealing on aluminum-doped ZnO thin films grown by atomic layer deposition

Cheng, Y. C.

Effects of post-deposition rapid thermal annealing on aluminum-doped ZnO thin films grown by atomic layer deposition

Cheng, Y. C.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effects of post-deposition rapid thermal annealing on aluminum-doped ZnO thin films grown by atomic layer deposition

Contributors:

Cheng, Y. C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 604-607

Publication date:

2011-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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