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Surface adhesion and demolding force dependence on resist composition in ultraviolet nanoimprint lithography

Amirsadeghi, A. / Lee, J. J. / Park, S.

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Surface adhesion and demolding force dependence on resist composition in ultraviolet nanoimprint lithography

Amirsadeghi, A. / Lee, J. J. / Park, S.

Surface adhesion and demolding force dependence on resist composition in ultraviolet nanoimprint lithography

Amirsadeghi, A. / Lee, J. J. / Park, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Surface adhesion and demolding force dependence on resist composition in ultraviolet nanoimprint lithography

Contributors:

Amirsadeghi, A. (author) / Lee, J. J. (author) / Park, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 1272-1278

Publication date:

2011-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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