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Chiral Nematic Fluids as Masks for Lithography

Jeong, H. S. / Kim, Y. H. / Lee, J. S. / Kim, J. H. / Srinivasarao, M. / Jung, H. T.

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Chiral Nematic Fluids as Masks for Lithography

Jeong, H. S. / Kim, Y. H. / Lee, J. S. / Kim, J. H. / Srinivasarao, M. / Jung, H. T.

Chiral Nematic Fluids as Masks for Lithography

Jeong, H. S. / Kim, Y. H. / Lee, J. S. / Kim, J. H. / Srinivasarao, M. / Jung, H. T.

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Document information

Title:

Chiral Nematic Fluids as Masks for Lithography

Contributors:

Jeong, H. S. (author) / Kim, Y. H. (author) / Lee, J. S. (author) / Kim, J. H. (author) / Srinivasarao, M. (author) / Jung, H. T. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 381-384

Publication date:

2012-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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