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    Effect of chemical surface treatments on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 films on Ge substrates

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    New search for: Liu, X.
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    New search for: Wu, D.

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    Effect of chemical surface treatments on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 films on Ge substrates

    New search for: Li, X.
    New search for: Li, A.
    New search for: Liu, X.
    New search for: Gong, Y.
    New search for: Chen, X.
    New search for: Li, H.
    New search for: Wu, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of chemical surface treatments on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 films on Ge substrates

    New search for: Li, X.
    New search for: Li, A.
    New search for: Liu, X.
    New search for: Gong, Y.
    New search for: Chen, X.
    New search for: Li, H.
    New search for: Wu, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Effect of chemical surface treatments on interfacial and electrical characteristics of atomic-layer-deposited Al2O3 films on Ge substrates

    Contributors:

    Li, X. (author) / Li, A. (author) / Liu, X. (author) / Gong, Y. (author) / Chen, X. (author) / Li, H. (author) / Wu, D. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 257 ; 4589-4592

    Publication date:

    2011-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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