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    Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

    New search for: Patil, V.S.
    New search for: Agrawal, K.S.
    New search for: Khairnar, A.G.
    New search for: Thibeault, B.J.
    New search for: Mahajan, A.M.

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    Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

    New search for: Patil, V.S.
    New search for: Agrawal, K.S.
    New search for: Khairnar, A.G.
    New search for: Thibeault, B.J.
    New search for: Mahajan, A.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

    New search for: Patil, V.S.
    New search for: Agrawal, K.S.
    New search for: Khairnar, A.G.
    New search for: Thibeault, B.J.
    New search for: Mahajan, A.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface

    Contributors:

    Patil, V.S. (author) / Agrawal, K.S. (author) / Khairnar, A.G. (author) / Thibeault, B.J. (author) / Mahajan, A.M. (author)

    Published in:

    Materials research bulletin ; 87 ; 208-213

    Publication date:

    2017-01-01

    Size:

    6 pages

    ISSN:

    0025-5408

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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