Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition: Fid-Bau Portal

Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

Guo, G. / Tang, G. / Wang, Y. / Ma, X. / Sun, M. / Wang, L. / Yukimura, K.

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Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

Guo, G. / Tang, G. / Wang, Y. / Ma, X. / Sun, M. / Wang, L. / Yukimura, K.

Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

Guo, G. / Tang, G. / Wang, Y. / Ma, X. / Sun, M. / Wang, L. / Yukimura, K.

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Check availability in my library

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Document information

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Document information

Title:

Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition

Contributors:

Guo, G. (author) / Tang, G. (author) / Wang, Y. (author) / Ma, X. (author) / Sun, M. (author) / Wang, L. (author) / Yukimura, K. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 4738-4742

Publication date:

2011-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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