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    Material selection methodology for gate dielectric material in metal-oxide-semiconductor devices

    New search for: Aditya, B.N.
    New search for: Gupta, N.
    New search for: Blundell, M.
    New search for: Jerrams, S.
    New search for: Edwards, K.L.

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    Material selection methodology for gate dielectric material in metal-oxide-semiconductor devices

    New search for: Aditya, B.N.
    New search for: Gupta, N.
    New search for: Blundell, M.
    New search for: Jerrams, S.
    New search for: Edwards, K.L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Material selection methodology for gate dielectric material in metal-oxide-semiconductor devices

    New search for: Aditya, B.N.
    New search for: Gupta, N.
    New search for: Blundell, M.
    New search for: Jerrams, S.
    New search for: Edwards, K.L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Material selection methodology for gate dielectric material in metal-oxide-semiconductor devices

    Contributors:

    Aditya, B.N. (author) / Gupta, N. (author) / Blundell, M. / Jerrams, S. / Edwards, K.L.

    Published in:

    New Rubber Materials, Test Methods and Processes ; 696-700

    MATERIALS AND DESIGN -REIGATE- ; 35

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0264-1275

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.0042

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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