A platform for research: civil engineering, architecture and urbanism
Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning
Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning
Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning
Yi, H. (author) / Bao, X. Y. (author) / Zhang, J. (author) / Bencher, C. (author) / Chang, L. W. (author) / Chen, X. (author) / Tiberio, R. (author) / Conway, J. (author) / Dai, H. (author) / Chen, Y. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 3107-3114
2012-01-01
8 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates
British Library Online Contents | 2006
|2D nano/micro hybrid patterning using soft/block copolymer lithography
British Library Online Contents | 2004
|British Library Online Contents | 2008
|Directed block copolymer self-assembly for nanoelectronics fabrication
British Library Online Contents | 2011
|