Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition: Fid-Bau Portal

Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Qi, L. / Hu, Z. / Li, W. / Qin, X. / Du, G. / Han, W. / Shi, W.

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Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Qi, L. / Hu, Z. / Li, W. / Qin, X. / Du, G. / Han, W. / Shi, W.

Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Qi, L. / Hu, Z. / Li, W. / Qin, X. / Du, G. / Han, W. / Shi, W.

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Check availability in my library

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Document information

Title:

Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Contributors:

Qi, L. (author) / Hu, Z. (author) / Li, W. (author) / Qin, X. (author) / Du, G. (author) / Han, W. (author) / Shi, W. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 15 ; 412-420

Publication date:

2012-01-01

Size:

9 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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